聚对二甲苯AF4的椭偏光谱研究

D. Solonenko, Madeleine Petschnigg, T. D. Dao, G. Miskovic
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引用次数: 1

摘要

对聚对二甲苯AF4薄膜在中红外(MIR)至深紫外(DUV)宽光学范围内的椭偏光谱进行了研究。利用模型和实验数据的光谱拟合,确定了随波长变化的折射率和消光系数。基于经典振荡理论建立的光学模型,由四个高斯峰函数和一个陶-洛伦兹峰函数组成,用于UV和Brendel-Bormann振荡-在MIR区域,通过监测介电函数的变化,可以快速精确地确定聚对二甲苯涂层的厚度以及分子的电子性质。对聚对二甲苯薄膜在450°C的环境气氛中进行热处理,表明其整体稳定性良好,光学跃迁能和折射率的变化可以忽略不计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Spectroscopic ellipsometry study of parylene AF4
The spectroscopic ellipsometry study of parylene AF4 films was performed in a broad optical range from mid-infrared (MIR) to deep ultra-violet (DUV) light. The wavelength-dependent refractive index and extinction coefficients were determined using the spectral fitting of the modeled and experimental data. The established optical model, based on the classical oscillator theory, comprised of four Gaussian and one Tauc-Lorentz peak functions for the UV and Brendel-Bormann oscillations – in MIR regions enables fast and precise thickness determination of parylene coatings as well as the electronic properties of the molecules by monitoring the alteration of the dielectric function. The thermal treatment of the films in ambient atmosphere up to 450°C showed the overall stability of the parylene film with only negligible alteration of the optical transition energies and thus its refractive index.
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