基于网状衬底的高空间分辨率CsI:Tl闪烁膜

Wei Zhang, M. Gu, Dalin Yao, Xiaolin Liu, Shi-ming Huang, Bo Liu, Chen Ni
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引用次数: 2

摘要

在网状图案衬底上制备了CsI:Tl闪烁薄膜。用扫描电子显微镜(SEM)测量了衬底的图案和CsI:Tl薄膜的形貌。结果表明:采用高宽均为5μm的SU-8光刻胶在衬底上形成的网格尺寸为55μm, CsI:Tl薄膜呈现出良好的柱状结构;通过MTF测量获得x射线成像的空间分辨率。在10% MTF水平下,有图案化基底上的CsI:Tl薄膜的空间频率可达10 lp/mm,比无图案化基底上的CsI:Tl薄膜的空间频率高2倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A high spatial resolution CsI:Tl scintillation film based on net-like substrate
CsI:Tl scintillation films were prepared on the net-like patterning substrates. The pattern of the substrates as well as the morphology of the CsI:Tl films were measured by SEM. The results show that the size of each grid on substrate is 55μm which is formed by SU-8 photoresist with 5μm in both height and width, and the CsI:Tl films display quite a good columnar structure. The spatial resolutions of X-ray imaging were taken by MTF measurement. The spatial frequency of the CsI:Tl films on patterned substrates can reach up to 10 lp/mm at the 10% level of MTF, which is twice higher than that of the CsI:Tl film on the substrate without patterning.
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