标准逻辑单元合成组合电路中的脉冲展宽

Semiu A. Olowogemo, W. H. Robinson, Ahmed Yiwere, Ebenezer Tachie-Menson, D. Limbrick, B. Lin
{"title":"标准逻辑单元合成组合电路中的脉冲展宽","authors":"Semiu A. Olowogemo, W. H. Robinson, Ahmed Yiwere, Ebenezer Tachie-Menson, D. Limbrick, B. Lin","doi":"10.1109/MWSCAS.2019.8885259","DOIUrl":null,"url":null,"abstract":"Technology scaling improves the power, area, and speed of an electronic design, but the reliability of newer technologies is impacted by the presence of radiation-induced transients; these transients are more pronounced in newer technologies. In the presence of variations due to process corners (P), operating voltage (V), and temperature (T), a transient pulse with no serious threat, which would be masked electrically, traverses more gates towards a storage element due to pulse broadening. In this paper, the transient pulses that initially pose no significant threat are simulated with PVT variations in arithmetic circuits from the EPFL benchmark suite to investigate the effect of variations on vulnerable gates. The results show that the variation enhances the transient pulses with no serious threat and causes pulse broadening from the locations of vulnerable gates. A mitigation approach is applied on the vulnerable gates of the sine circuit, and the masking capability during worst-case analysis improves on average by 76.5% for process corner variation, 85.5% for operating voltage variation, and 84.4% for temperature variation.","PeriodicalId":287815,"journal":{"name":"2019 IEEE 62nd International Midwest Symposium on Circuits and Systems (MWSCAS)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Pulse Broadening in Combinational Circuits with Standard Logic Cell Synthesis\",\"authors\":\"Semiu A. Olowogemo, W. H. Robinson, Ahmed Yiwere, Ebenezer Tachie-Menson, D. Limbrick, B. Lin\",\"doi\":\"10.1109/MWSCAS.2019.8885259\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Technology scaling improves the power, area, and speed of an electronic design, but the reliability of newer technologies is impacted by the presence of radiation-induced transients; these transients are more pronounced in newer technologies. In the presence of variations due to process corners (P), operating voltage (V), and temperature (T), a transient pulse with no serious threat, which would be masked electrically, traverses more gates towards a storage element due to pulse broadening. In this paper, the transient pulses that initially pose no significant threat are simulated with PVT variations in arithmetic circuits from the EPFL benchmark suite to investigate the effect of variations on vulnerable gates. The results show that the variation enhances the transient pulses with no serious threat and causes pulse broadening from the locations of vulnerable gates. A mitigation approach is applied on the vulnerable gates of the sine circuit, and the masking capability during worst-case analysis improves on average by 76.5% for process corner variation, 85.5% for operating voltage variation, and 84.4% for temperature variation.\",\"PeriodicalId\":287815,\"journal\":{\"name\":\"2019 IEEE 62nd International Midwest Symposium on Circuits and Systems (MWSCAS)\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 IEEE 62nd International Midwest Symposium on Circuits and Systems (MWSCAS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MWSCAS.2019.8885259\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 62nd International Midwest Symposium on Circuits and Systems (MWSCAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSCAS.2019.8885259","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

技术规模化提高了电子设计的功率、面积和速度,但新技术的可靠性受到辐射诱发瞬变的影响;这些暂态在新技术中更为明显。由于工艺角(P),工作电压(V)和温度(T)的变化,没有严重威胁的瞬态脉冲将被电掩盖,由于脉冲展宽,向存储元件穿过更多的门。本文利用EPFL基准测试套件中的算法电路中的PVT变化对初始不构成重大威胁的瞬态脉冲进行了模拟,以研究变化对脆弱门的影响。结果表明,这种变化增强了没有严重威胁的瞬态脉冲,并使脉冲从脆弱门的位置展宽。对正弦电路的脆弱栅极采用了一种缓解方法,在最坏情况分析时,工艺角变化的掩蔽能力平均提高76.5%,工作电压变化的掩蔽能力平均提高85.5%,温度变化的掩蔽能力平均提高84.4%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pulse Broadening in Combinational Circuits with Standard Logic Cell Synthesis
Technology scaling improves the power, area, and speed of an electronic design, but the reliability of newer technologies is impacted by the presence of radiation-induced transients; these transients are more pronounced in newer technologies. In the presence of variations due to process corners (P), operating voltage (V), and temperature (T), a transient pulse with no serious threat, which would be masked electrically, traverses more gates towards a storage element due to pulse broadening. In this paper, the transient pulses that initially pose no significant threat are simulated with PVT variations in arithmetic circuits from the EPFL benchmark suite to investigate the effect of variations on vulnerable gates. The results show that the variation enhances the transient pulses with no serious threat and causes pulse broadening from the locations of vulnerable gates. A mitigation approach is applied on the vulnerable gates of the sine circuit, and the masking capability during worst-case analysis improves on average by 76.5% for process corner variation, 85.5% for operating voltage variation, and 84.4% for temperature variation.
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