LDMOS晶体管的安全工作区域考虑

P. Hower, J. Lin, S. Haynie, S. Paiva, R. Shaw, N. Hepfinger
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引用次数: 34

摘要

击穿电压和导通电阻之间的权衡是横向和垂直DMOS晶体管的一个众所周知的特征。“安全操作区域”所施加的权衡和限制就不那么熟悉了。SOA定义了I/sub / d/-V/sub / ds/平面上操作点漂移的限制。正确地说,SOA还应该包括热限制;然而,这些可以分开处理。在本文中,我们关注的是“电气SOA”,它是由I/sub / d/-V/sub / ds/平面中的特定边界线定义的。尽管LDMOS SOA已经在许多论文中进行了讨论,但是决定SOA边界的设备物理细节仍然不太清楚,需要进一步的工作。本文的主要目的是研究SOA边界附近的设备行为,然后使用这些结果来预测SOA。我们使用自对准体扩散来考虑具有和不具有漏极扩展的设备。预测的SOA与两种类型的LDMOS的测量结果非常吻合。详细检查了装置内的电流流动情况。观察到的SOA显示与硅功率密度限制一致,硅器件的基本特征。最后,我们展示了如何使用漏极区域的简化双端模型来演示LDMOS在接近弹回时的行为。这种方法类似于先前用于模拟双极晶体管雪崩引发的第二次击穿的方法(hower和Reddi, 1970)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Safe operating area considerations in LDMOS transistors
The trade-off between breakdown voltage and on-resistance is a well-known feature of both lateral and vertical DMOS transistors. The trade-offs and restrictions imposed by the "safe operating area" are less familiar. The SOA defines limits on the excursion of the operating point in the I/sub d/-V/sub ds/ plane. To be correct, the SOA should also include thermal limitations; however, these can be treated separately. In this paper, we focus on the "electrical SOA", which is defined by a specific boundary line in the I/sub d/-V/sub ds/ plane. Although the LDMOS SOA has been discussed in a number of papers, the details of the device physics that determine the SOA boundary are still somewhat unclear and further work is needed. The main purpose of this paper is to investigate device behaviour in the neighborhood of the SOA boundary and then use these results to predict the SOA. We consider devices with and without drain extensions using a self-aligned body diffusion. The predicted SOA is shown to be in good agreement with measurements for both types of LDMOS. Current flow within the device is examined in detail. The observed SOA is shown to be consistent with the silicon power density limit, a fundamental characteristic of silicon devices. Finally, we show how a simplified two-terminal model of the drain region can be used to demonstrate the behaviour of the LDMOS as it approaches snap-back. This approach is analogous to that previously used to model the onset of avalanche initiated second breakdown in bipolar transistors (hower and Reddi, 1970).
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