用于RFIC应用的ldmosfet的高温性能

P. Perugupalli, M. Trivedi, K. Shenai, S. K. Leong
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引用次数: 3

摘要

本文介绍了用于无线应用的射频ldmosfet的高温特性。自加热是射频功率晶体管中的一个重要问题。如果封装没有经过优化设计以散热器件中产生的热量,则自加热可能导致器件中的热失控。在SOI器件中,由于埋藏的氧化层的存在,由于自加热引起的温升比体硅的导热性更小,因此引起了更大的关注。在这项工作中,使用二维有限元电热模拟器来研究自加热的程度。在包含封装寄生的MIXEDMODE电路/器件模拟器中求解热模型,研究器件自加热引起的温升。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High temperature performance of LDMOSFETs used in RFIC applications
This paper presents the high temperature behaviour of RF LDMOSFETs used in wireless applications. Self heating is an important issue in RF power transistors. Self heating could cause thermal runaway in the device if the package has not been optimally designed to dissipate the heat generated in the device. Temperature rise due to self heating is of greater concern in SOI devices because of the presence of the buried oxide layer which has lesser thermal conductivity than bulk Si. In this work, 2D finite element electrothermal simulators were used to investigate the extent of self heating. Thermal models were solved in the MIXEDMODE circuit/device simulator with the package parasitics included, to study the temperature rise in the device due to self heating.
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