N. Saysset-Malbert, B. Lambert, C. Maneux, N. Labat, A. Touboul, Y. Danto, P. Huguet, P. Auxemery, F. Garat
{"title":"利用低频噪声和漏极电流瞬态分析研究GaAs功率mesfet射频寿命试验","authors":"N. Saysset-Malbert, B. Lambert, C. Maneux, N. Labat, A. Touboul, Y. Danto, P. Huguet, P. Auxemery, F. Garat","doi":"10.1109/GAASRW.1999.874163","DOIUrl":null,"url":null,"abstract":"The purpose of this work is to evaluate the impact of RF life-test under gain compression on ion-implanted power MESFETs by LF gate noise and drain noise analysis combined with drain current transient spectroscopy (DCTS). While the devices under test belong to a mature technology, such an evaluation aims at reaching space program requirements in terms of reliability assessment.","PeriodicalId":433600,"journal":{"name":"1999 GaAs Reliability Workshop. Proceedings (Cat. No.00TH8459)","volume":"169 ","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Investigation on GaAs power MESFETs submitted to RF life-test by LF noise and drain current transient analysis\",\"authors\":\"N. Saysset-Malbert, B. Lambert, C. Maneux, N. Labat, A. Touboul, Y. Danto, P. Huguet, P. Auxemery, F. Garat\",\"doi\":\"10.1109/GAASRW.1999.874163\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The purpose of this work is to evaluate the impact of RF life-test under gain compression on ion-implanted power MESFETs by LF gate noise and drain noise analysis combined with drain current transient spectroscopy (DCTS). While the devices under test belong to a mature technology, such an evaluation aims at reaching space program requirements in terms of reliability assessment.\",\"PeriodicalId\":433600,\"journal\":{\"name\":\"1999 GaAs Reliability Workshop. Proceedings (Cat. No.00TH8459)\",\"volume\":\"169 \",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-10-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1999 GaAs Reliability Workshop. Proceedings (Cat. No.00TH8459)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GAASRW.1999.874163\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 GaAs Reliability Workshop. Proceedings (Cat. No.00TH8459)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GAASRW.1999.874163","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Investigation on GaAs power MESFETs submitted to RF life-test by LF noise and drain current transient analysis
The purpose of this work is to evaluate the impact of RF life-test under gain compression on ion-implanted power MESFETs by LF gate noise and drain noise analysis combined with drain current transient spectroscopy (DCTS). While the devices under test belong to a mature technology, such an evaluation aims at reaching space program requirements in terms of reliability assessment.