掺铒二氧化钒薄膜的光开关和光致发光

COMMAD 2012 Pub Date : 2012-12-01 DOI:10.1557/OPL.2013.544
H. Lim, J. McCallum, N. Stavrias, R. Marvel, R. Haglund
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引用次数: 20

摘要

二氧化钒(VO2)在相对较低的临界温度Tc≈67°C[1]下发生绝缘体-金属转变(IMT),其电学和光学性质发生剧烈变化。当由光脉冲触发时,开关速度非常快,在飞秒的时间尺度内。铒(Er3+)在标准电信波长1535nm处具有受激辐射,已广泛应用于光纤通信系统[3]。VO2和Er3+的结合可以制造出能够同时放大信号的超快光开关。在这项工作中,我们从理论上和实验上研究了制造这种装置的可能性。我们的实验方法包括温度驱动的光开关测试和Er3+植入VO2薄膜的光致发光(PL)光谱。观察薄膜中VO2的IMT和Er3+的PL对于确定VO2:Er系统是否可以作为光开关和放大器至关重要。研究了一系列的注入和后退火方案,试图找到最佳的加工条件,以最大限度地提高光开关和PL的质量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical switching and photoluminescence in erbium implanted vanadium dioxide thin films
Vanadium dioxide (VO2) undergoes an insulator-metal transition (IMT) that involves drastic changes in its electrical and optical properties at relatively low critical temperature Tc ≈ 67°C [1]. The switching speed when triggered by an optical impulse is incredibly fast, within a femtosecond timescale [2]. Erbium (Er3+) with a stimulated emission at the standard telecommunication wave-length of 1535nm has been used extensively in fiber-optic communication systems [3]. The combination of VO2 and Er3+ could make an ultrafast optical switch that is capable of simultaneous signal amplification. In this work, we investigated the possibilities of making such a device, both theoretically and experimentally. Our experimental methods involve temperature-driven optical switching tests and photoluminescence (PL) spectroscopy on Er3+ implanted VO2 thin films. The observations of the IMT of VO2 and the PL of Er3+ in the thin films would be vital in determining whether the VO2:Er system would work as an optical switch and amplifier. A range of implantation and post-annealing schemes were explored in an attempt to find the optimal processing conditions that would maximize the qualities of the optical switching and PL.
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