F. Topart, B. Flietner, M. Josowicz, M. Leu, H. Lorenz, M. Peschke, H. Riess, I. Eisele
{"title":"栅极绝缘子对悬浮栅场效应管气体测量的影响","authors":"F. Topart, B. Flietner, M. Josowicz, M. Leu, H. Lorenz, M. Peschke, H. Riess, I. Eisele","doi":"10.1109/SENSOR.1991.149058","DOIUrl":null,"url":null,"abstract":"An attempt is made to separate the relative contributions to the threshold voltage shift of the layers composing a suspended gate FET (SGFET). For that purpose the insulators silicon nitride and diamondlike (a-C:H) films, as well as the sputtered SnO/sub 2/ and Ti/W, active layers have been investigated. The gas-surface interaction has been characterized by carrying out simultaneous measurements of mass changes (quartz crystal microbalance) and work function shifts (Kelvin probe). It is shown that the threshold voltage shift of SGFETs, composed of various insulator/active layer combinations, is a superposition of the independently measured work function shifts.<<ETX>>","PeriodicalId":273871,"journal":{"name":"TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Influence of the gate insulator on gas measurements with suspended gate FETs\",\"authors\":\"F. Topart, B. Flietner, M. Josowicz, M. Leu, H. Lorenz, M. Peschke, H. Riess, I. Eisele\",\"doi\":\"10.1109/SENSOR.1991.149058\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An attempt is made to separate the relative contributions to the threshold voltage shift of the layers composing a suspended gate FET (SGFET). For that purpose the insulators silicon nitride and diamondlike (a-C:H) films, as well as the sputtered SnO/sub 2/ and Ti/W, active layers have been investigated. The gas-surface interaction has been characterized by carrying out simultaneous measurements of mass changes (quartz crystal microbalance) and work function shifts (Kelvin probe). It is shown that the threshold voltage shift of SGFETs, composed of various insulator/active layer combinations, is a superposition of the independently measured work function shifts.<<ETX>>\",\"PeriodicalId\":273871,\"journal\":{\"name\":\"TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SENSOR.1991.149058\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSOR.1991.149058","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Influence of the gate insulator on gas measurements with suspended gate FETs
An attempt is made to separate the relative contributions to the threshold voltage shift of the layers composing a suspended gate FET (SGFET). For that purpose the insulators silicon nitride and diamondlike (a-C:H) films, as well as the sputtered SnO/sub 2/ and Ti/W, active layers have been investigated. The gas-surface interaction has been characterized by carrying out simultaneous measurements of mass changes (quartz crystal microbalance) and work function shifts (Kelvin probe). It is shown that the threshold voltage shift of SGFETs, composed of various insulator/active layer combinations, is a superposition of the independently measured work function shifts.<>