{"title":"新设计，更快，更敏感的扫描电容显微镜的故障分析","authors":"Haigang Zhang, M. Kocuń, B. Ohler, R. Proksch","doi":"10.31399/asm.cp.istfa2022p0434","DOIUrl":null,"url":null,"abstract":"\n A new scanning capacitance microscope, with an optimized, modern RF circuitry is described. The new design results in improved ease of use and sensitivity. We will discuss the design details and show application examples on semiconductor devices and ferroelectric materials.","PeriodicalId":417175,"journal":{"name":"International Symposium for Testing and Failure Analysis","volume":"130 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Newly Designed, Faster, and More Sensitive Scanning Capacitance Microscope for Failure Analysis\",\"authors\":\"Haigang Zhang, M. Kocuń, B. Ohler, R. Proksch\",\"doi\":\"10.31399/asm.cp.istfa2022p0434\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n A new scanning capacitance microscope, with an optimized, modern RF circuitry is described. The new design results in improved ease of use and sensitivity. We will discuss the design details and show application examples on semiconductor devices and ferroelectric materials.\",\"PeriodicalId\":417175,\"journal\":{\"name\":\"International Symposium for Testing and Failure Analysis\",\"volume\":\"130 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-10-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium for Testing and Failure Analysis\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.31399/asm.cp.istfa2022p0434\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium for Testing and Failure Analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.cp.istfa2022p0434","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Newly Designed, Faster, and More Sensitive Scanning Capacitance Microscope for Failure Analysis
A new scanning capacitance microscope, with an optimized, modern RF circuitry is described. The new design results in improved ease of use and sensitivity. We will discuss the design details and show application examples on semiconductor devices and ferroelectric materials.
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