应力< 100 > /(001)mosfet的表面散射对称性降低和迁移率模型

F. M. Bufler, A. Erlebach, M. Oulmane
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引用次数: 6

摘要

结果表明,栅极界面打破了< 100 > /(001)pmosfet中迁移率在垂直方向和横向方向上的等效性,导致独立的一阶压电系数由3个变为6个。这是从蒙特卡罗(MC)模拟中发现的,单轴垂直和横向应力产生不同的有效迁移率,这可以用镜面散射的能量和平行动量守恒来解释。提出了具有应力相关的一阶压电系数的迁移率模型。该模型不仅能很好地再现低应力和高应力下相应的MC有效迁移率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Symmetry reduction by surface scattering and mobility model for stressed 〈100〉/(001) MOSFETs
It is demonstrated that the gate interface breaks the equivalence between vertical and transverse direction for the mobility in 〈100〉/(001) pMOSFETs, leading to 6 instead of 3 independent 1st order piezoconductance coefficients. This is found from Monte Carlo (MC) simulations yielding different effective mobilities for uniaxial vertical and transverse stress, which can be explained in terms of energy and parallel-momentum conservation upon specular surface scattering. A mobility model with stress-dependent 1st order piezoconductance coefficients is presented. This model is shown to reproduce well corresponding MC effective mobilities not only for low, but also for high stress.
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