L. Sambuco Salomone, O. Beldarrain, F. Campabadal, A. Faigón
{"title":"确定高κ层介电常数的量化能带模型","authors":"L. Sambuco Salomone, O. Beldarrain, F. Campabadal, A. Faigón","doi":"10.1109/EAMTA.2015.7237377","DOIUrl":null,"url":null,"abstract":"A quantized bands model capable to generate capacitance-voltage (C-V) curves of MOS capacitors was implemented and numerical details are discussed. This model is applied to the extraction of the dielectric constant of Al2O3 layers with known physical thicknesses by fitting experimental results. A comparison with a continuum band model is presented.","PeriodicalId":101792,"journal":{"name":"2015 Argentine School of Micro-Nanoelectronics, Technology and Applications (EAMTA)","volume":"42 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Quantized bands model for the determination of the dielectric constant of high-κ layers\",\"authors\":\"L. Sambuco Salomone, O. Beldarrain, F. Campabadal, A. Faigón\",\"doi\":\"10.1109/EAMTA.2015.7237377\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A quantized bands model capable to generate capacitance-voltage (C-V) curves of MOS capacitors was implemented and numerical details are discussed. This model is applied to the extraction of the dielectric constant of Al2O3 layers with known physical thicknesses by fitting experimental results. A comparison with a continuum band model is presented.\",\"PeriodicalId\":101792,\"journal\":{\"name\":\"2015 Argentine School of Micro-Nanoelectronics, Technology and Applications (EAMTA)\",\"volume\":\"42 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 Argentine School of Micro-Nanoelectronics, Technology and Applications (EAMTA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EAMTA.2015.7237377\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 Argentine School of Micro-Nanoelectronics, Technology and Applications (EAMTA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EAMTA.2015.7237377","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Quantized bands model for the determination of the dielectric constant of high-κ layers
A quantized bands model capable to generate capacitance-voltage (C-V) curves of MOS capacitors was implemented and numerical details are discussed. This model is applied to the extraction of the dielectric constant of Al2O3 layers with known physical thicknesses by fitting experimental results. A comparison with a continuum band model is presented.