A. Chasin, J. Franco, E. Bury, R. Ritzenthaler, E. Litta, A. Spessot, N. Horiguchi, D. Linten, B. Kaczer
{"title":"翅片尺寸与高压退火对热载流子降解的相关性","authors":"A. Chasin, J. Franco, E. Bury, R. Ritzenthaler, E. Litta, A. Spessot, N. Horiguchi, D. Linten, B. Kaczer","doi":"10.1109/IRPS45951.2020.9129584","DOIUrl":null,"url":null,"abstract":"In this work, we address two open issues of HotCarrier Degradation (HCD) on n-type FinFET devices. Firstly, the controversial impact of fin width is studied in terms of exact {VOV ,VD} stress conditions and taking in account the impact of external parasitic series resistance and Self-Heating Effects (SHE). Secondly, the impact of Hydrogen/Deuterium High-Pressure Anneal (HPA) on both time-0 and reliability is evaluated.","PeriodicalId":116002,"journal":{"name":"2020 IEEE International Reliability Physics Symposium (IRPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Relevance of fin dimensions and high-pressure anneals on hot-carrier degradation\",\"authors\":\"A. Chasin, J. Franco, E. Bury, R. Ritzenthaler, E. Litta, A. Spessot, N. Horiguchi, D. Linten, B. Kaczer\",\"doi\":\"10.1109/IRPS45951.2020.9129584\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we address two open issues of HotCarrier Degradation (HCD) on n-type FinFET devices. Firstly, the controversial impact of fin width is studied in terms of exact {VOV ,VD} stress conditions and taking in account the impact of external parasitic series resistance and Self-Heating Effects (SHE). Secondly, the impact of Hydrogen/Deuterium High-Pressure Anneal (HPA) on both time-0 and reliability is evaluated.\",\"PeriodicalId\":116002,\"journal\":{\"name\":\"2020 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS45951.2020.9129584\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS45951.2020.9129584","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Relevance of fin dimensions and high-pressure anneals on hot-carrier degradation
In this work, we address two open issues of HotCarrier Degradation (HCD) on n-type FinFET devices. Firstly, the controversial impact of fin width is studied in terms of exact {VOV ,VD} stress conditions and taking in account the impact of external parasitic series resistance and Self-Heating Effects (SHE). Secondly, the impact of Hydrogen/Deuterium High-Pressure Anneal (HPA) on both time-0 and reliability is evaluated.