采用1.5 V, 0.18 /spl mu/m部分耗尽SOI技术的高性能sram

R. Joshi, A. Pellela, O. Wagner, Y. Chan, W. Dachtera, S. Wilson, S. Kowalczyk
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引用次数: 4

摘要

本文描述了在1.5 V, 0.18 /spl mu/m部分耗尽(PD) SOI CMOS技术下,读取访问时间低于500 ps,周期时间约为2 GHz的高速sram。本文还提供了改进PD SOI性能和功能的稳健设计。本文的重点是对假静态电路的优化时序,感测放大器的新设计,在高温和电池稳定性下提高功能和性能的设计技术。此外,通过提供由可编程“阵列内置自检”(ABIST)生成的广泛测试模式覆盖,展示了具有高产量的全功能SRAM(目录,L1缓存和其他SRAM)硬件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High performance SRAMs in 1.5 V, 0.18 /spl mu/m partially depleted SOI technology
This paper describes high speed SRAMs with read access time below 500 ps and a cycle time around 2 GHz in 1.5 V, 0.18 /spl mu/m partially depleted (PD) SOI CMOS technology. The paper also provides the robust designs to improve performance and functionality in PD SOI. The highlights of the paper are optimized timing for pseudostatic circuits, novel design of the sense amplifier, design techniques to improve functionality and performance at high temperatures and cell stability. Also a full functional SRAM (Directory, L1 Cache and other SRAMs) hardware with high yields is demonstrated by providing extensive test pattern coverage generated by a programmable "Array-Built-In-Self-Test" (ABIST).
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