锗基热氧化氧化锗的活化能

N. A. A. Halim, S. K. Sahari, A. A. Hamzah, B. Majlis, S. Marini, L. Hasanah, M. Kashif
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引用次数: 1

摘要

在450 ~ 600℃的氧化温度范围内,通过测定氧化层厚度随温度的变化,研究了GeO2的活化能。结果表明,在450 ~ 575℃氧化温度下,氧化时间与氧化厚度呈线性关系;在600℃氧化温度下,氧化时间越短,氧化厚度与氧化时间呈线性关系。氧化速率上升至0.55,当氧化温度升高至600℃时,氧化速率突然下降,这说明在较高的氧化温度下(600℃)发生了氧混合,而不是扩散机制,导致活化能降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Activation energy of thermal oxidation germanium oxide on germanium substrates
The activation energy of GeO2 was studied by determining the oxide thickness versus temperature from lower to higher oxidation temperature in the range between 450°C and 600°C. It was found that a linear relationship can be obtained between oxidation time and oxide thickness for the oxidation temperature between 450 and 575°C while for the 600°C oxidation, a linear relationship can be obtained for the shorter oxidation time. The rate of oxidation increased until 0.55 and abruptly decreased after increasing oxidation temperature to 600°C which implies that the oxygen intermixing occurs during higher oxidation (600°C) rather that diffusion mechanism that leads to the lower activation energy.
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