InAs纳米线中与尺寸相关的电子迁移率

E. G. Marín, F. Ruiz, A. Godoy, I. M. Tienda-Luna, F. Gámiz
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引用次数: 1

摘要

本文研究了InAs纳米线中的电子迁移率,考虑了决定其行为的主要散射机制的贡献。此外,我们还分析了其与纳米线直径、载流子密度以及Γ、L和X山谷的居群的关系。发现表面粗糙度和极性光学声子是限制其迁移行为的主要散射机制。我们还发现,L谷的电子迁移率远低于Γ谷的电子迁移率,因为它们具有更高的传导有效质量。随着纳米线直径的减小,更高的L山谷数量和更强的表面粗糙度散射影响降低了InAs的高迁移率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Size-dependent electron mobility in InAs nanowires
This work studies the electron mobility in InAs nanowires, taking into account the contribution of the main scattering mechanisms that determine its behavior. Moreover, we analyze its dependence on the nanowire diameter, carrier density and population of the Γ, L and X valleys. It is found that surface roughness and polar optical phonons are the scattering mechanisms that mainly limit the mobility behavior. We also show that the electron mobility of the L valleys is much lower than the one of the Γ valley, because of the higher conduction effective mass. The combination of the higher population of the L valleys and the stronger impact of the surface roughness scattering degrades the characteristic high mobility of InAs as the nanowire diameter decreases.
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