精密球面加成法的初步研究

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1996-05-24 DOI:10.1364/eul.1996.dfo156

F. Weber, C. Montcalm, S. Vernon, D. Kania

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引用次数: 1

摘要

我们报告了利用掩蔽技术沉积渐变周期Mo/Si多层涂层的精密光学基底非球化的进展。这些初步结果表明，在85%以上的样品中，测量的厚度和期望的厚度之间的一致性很好，然而，在中心区域观察到高达7%的厚度偏差。这些误差是由于在沉积过程中掩模相对于衬底的错位造成的。

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Preliminary investigation of an additive approach to the fabrication of precision aspheres

We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7% are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition.

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Extreme Ultraviolet Lithography (TOPS)

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