用无掩模光刻技术制备二维衍射光栅

2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) Pub Date : 2014-10-30 DOI:10.1109/SBMICRO.2014.6940083

G. Cirino, A. Montagnoli, N. Frateschi

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引用次数: 3

摘要

本文介绍了一种具有光相位调制的二维衍射光栅的制作。该器件采用迭代傅里叶变换算法设计，采用无掩模直接激光书写系统制作。衍射图的光学表征表明，所制备的器件与其设计具有良好的匹配性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Two-dimensional diffraction grating fabricated by maskless lithography

This work presents the fabrication of a two-dimensional diffraction grating with light phase modulation. The device was designed by employing the Iterative Fourier Transform Algorithm and fabricated by maskless direct laser writing system. Optical characterization of the diffraction pattern shown a good matching between the fabricated device and its design.

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来源期刊

2014 29th Symposium on Microelectronics Technology and Devices (SBMicro)

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