隧道路径对TFET器件半经典数值模拟的影响

L. De Michielis, M. Iellina, P. Palestri, A. Ionescu, L. Selmi
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引用次数: 3

摘要

在这项工作中,非局部带对带隧道模型已实现到一个全波段蒙特卡罗模拟器。本文采用了两种不同的隧穿路径选择方法,并研究了它们对不同隧道场效应管结构传递特性的影响。在我们模拟的SOI和DG TFET架构中,根据隧道路径的选择,可以发现电流低估高达1个数量级,亚阈值斜率值相差高达15%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunneling path impact on semi-classical numerical simulations of TFET devices
In this work a non-local band-to-band tunnelling model has been implemented into a full-band Monte Carlo simulator. Two different approaches for the choice of the tunnelling path have been implemented and their impact on the transfer characteristics of different Tunnel FET structures is investigated. In both the SOI and the DG TFET architectures we have simulated, up to 1 order of magnitude of underestimation in the current and up to 15% of difference in the value of the Subthreshold Slope can be found according to the choice of the tunnelling path.
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