pHEMT在4.2 K时的低功耗和低频噪声性能研究

T. Lucas, Y. Jin
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引用次数: 4

摘要

实现了栅极长度为1μm的伪晶GaAs hemt,并在4.2K下进行了表征。对于栅极宽度为4mm的器件,在任何实际偏置条件下,栅极漏电流均小于1pA,总输入电容均小于10pF。当栅极偏置变化小于半伏特时,通道电阻可以被修改10倍以上。在功耗等于或小于0.15mW的情况下,可以获得高于10的本征电压增益。在此电源条件下,在1、10和100kHz频率下分别可获得8.4、3.2和低至1.3nV/√Hz的等效输入噪声电压。我们研究了噪声电压作为漏极电流的函数。最后,本工作的实验结果表明,器件的噪声电压可以与其直流参数相关联。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigations on the low-power and low-frequency noise performance of pHEMT at 4.2 K
Pseudomorphic GaAs HEMTs with a gate length of 1μm have been realized and characterized at 4.2K. For the device with a gate width of 4mm, a gate leakage current less than 1pA and a total input capacitance lower than 10pF have been obtained for any practical bias conditions. The channel resistance can be modified more than 10 9 times with a gate bias variation less than a half volt. An intrinsic voltage gain higher than 10 can be reached with a power dissipation equal to or less than 0.15mW. Under this power supply condition, equivalent input noise voltages of 8.4, 3.2 and down to 1.3nV/√Hz can be obtained at frequencies of 1, 10 and 100kHz respectively. This noise voltage has been studied as a function of the drain current. Finally, the experimental results of this work have shown that the device's noise voltage can be linked to its DC parameters.
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