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使用同步辐射的半导体工艺现场监测[生长和清洗]

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797531
Y. Takaku
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摘要

本文主要讨论了利用同步辐射光电子能谱技术在Si表面进行气源分子束外延(GSMBE)和光子诱导除氢的现场监测。
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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In situ monitoring of semiconductor processes using synchrotron radiation [growth and cleaning]
In this review paper, discussion is focused on the in-situ monitoring of gas source molecular beam epitaxy (GSMBE) and photon-induced hydrogen removal on Si surfaces using synchrotron radiation photoelectron spectroscopy.
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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
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