N. Nakamura, Ryokou Kato, H. Sakai, K. Tsuchiya, Y. Tanimoto, Y. Honda, T. Miyajima, M. Shimada, T. Obina, H. Kawata
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Demonstration of proof of concept of the EUV-FEL for future lithography
An ERL(energy recovery linac)-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic noise and to achieve higher throughput. An IR-FEL project started at the KEK cERL for the purpose of developing high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. We will briefly review the EUV-FEL and present construction and commissioning of the cERL IR-FEL including future work.
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