在高压nLDMOS中实现了一种新的弱回调特性

Shen-Li Chen, T. Wu, Hung-Wei Chen, C. Shih, Po-Ying Chen
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引用次数: 1

摘要

本文提出了一种通过掺杂浓度和长度调制n型自适应层的漏极侧工程来获得弱回吸特性的nLDMOS。这是一种降低触发电压(Vt1)和提高保持电压(Vh)的新方法。这些努力将非常适合于高压电源管理IC的应用。同时,我们将讨论这些新型高压nLDMOS器件的触发电压、保持电压和Ron电阻分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
To achieve a novel weak snapback characteristic in the high voltage nLDMOS
A drain-side engineering to LDMOS by doping concentration and length modulations of the N-type adaptive layer to obtain weak snapback characteristic nLDMOS are presented in this work. It's a novel method to reduce trigger voltage(Vt1) and to increase holding voltage(Vh). These efforts will be very suitable for the HV power management IC applications. Meanwhile, in this work, we will discuss trigger voltage, holding voltage and Ron resistance distribution of these novel HV nLDMOS devices.
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