β-CuPc/poly (NVK-BMA)的红外光导性能

Conference on Electrical Insulation & Dielectric Phenomena — Annual Report 1987 Pub Date : 1987-10-01 DOI:10.1109/CEIDP.1987.7736562

H. Zhang, D. Pan, J. Wen

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引用次数: 0

摘要

聚(n -乙烯基咔唑)(PVK)是众所周知的具有经典刚度的电子给体。相反，单体甲基丙烯酸丁酯(BMA)作为电子受体，具有可弯曲的侧基，可用作内增塑剂。因此NVK- bma体系在NVK均聚的约束下易于共聚;它的机械性能和工艺性能自然会得到改善。问题是共聚物的光导电性，特别是在红外区，是否会增强。

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IR photoconductivity of β-CuPc/poly (NVK-BMA)

Poly(N-vinylcarbazole) (PVK) is well known as an electron donor with classical stiffness. In contrast, the monomer butyl methacrylate (BMA), being an electron acceptor, possesses a flexible side group, which may be used as an internal plasticizer. The NVK-BMA system is therefore easy to be copolymerized with the restraint of hompolymerization of NVK; its mechanical and technological properties will naturally be improved. The question is whether the photoconductivity of the copolymer, especially in the IR region, will be enhanced.

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Conference on Electrical Insulation & Dielectric Phenomena — Annual Report 1987

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