{"title":"关键尺寸测量中一种新的自动对焦方法","authors":"F. Komatsu, H. Motoki, M. Miyoshi","doi":"10.1109/ATS.1997.643959","DOIUrl":null,"url":null,"abstract":"We have developed a new auto-focus method using the image processing technology. This method consists of two steps. The first step is the preset of the objective lens condition with the feedback of Z-sensor. In the second step, the pattern recognition of a target hole pattern is performed prior to auto-focusing scan in order to scan E-beam accurately over the pattern. The measurement repeatability (3/spl sigma/) can be achieved within 3.9 nm. The pass rate of 98.7% can be realized in the present auto-focus method.","PeriodicalId":330767,"journal":{"name":"Proceedings Sixth Asian Test Symposium (ATS'97)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A new auto-focus method in critical dimension measurement SEM\",\"authors\":\"F. Komatsu, H. Motoki, M. Miyoshi\",\"doi\":\"10.1109/ATS.1997.643959\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have developed a new auto-focus method using the image processing technology. This method consists of two steps. The first step is the preset of the objective lens condition with the feedback of Z-sensor. In the second step, the pattern recognition of a target hole pattern is performed prior to auto-focusing scan in order to scan E-beam accurately over the pattern. The measurement repeatability (3/spl sigma/) can be achieved within 3.9 nm. The pass rate of 98.7% can be realized in the present auto-focus method.\",\"PeriodicalId\":330767,\"journal\":{\"name\":\"Proceedings Sixth Asian Test Symposium (ATS'97)\",\"volume\":\"33 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-11-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings Sixth Asian Test Symposium (ATS'97)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ATS.1997.643959\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Sixth Asian Test Symposium (ATS'97)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ATS.1997.643959","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A new auto-focus method in critical dimension measurement SEM
We have developed a new auto-focus method using the image processing technology. This method consists of two steps. The first step is the preset of the objective lens condition with the feedback of Z-sensor. In the second step, the pattern recognition of a target hole pattern is performed prior to auto-focusing scan in order to scan E-beam accurately over the pattern. The measurement repeatability (3/spl sigma/) can be achieved within 3.9 nm. The pass rate of 98.7% can be realized in the present auto-focus method.
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