使用腔室阻抗监测器减少PECVD清洗引起的PFC排放的最有效方法

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Pub Date : 2000-09-26 DOI:10.1109/ISSM.2000.993635

T. Yoda, M. Shimizu

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引用次数: 0

摘要

减少等离子体增强化学气相沉积(PECVD)清洗过程中PFC的排放是实现世界半导体理事会(WSC) 1999年制定的严格目标的关键。提出了利用腔室阻抗监测仪减少现有生产线PFC排放的有效方法。

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The most effective method for reducing PFC emissions caused by PECVD cleaning using the chamber impedance monitor

Reducing PFC emissions from PECVD (plasma enhanced chemical vapor deposition) cleaning is the key to meet the strict targets set by the WSC (World Semiconductor Council) in 1999. The effective method using the chamber impedance monitor is proposed for reducing PFC emissions for existing production lines.

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Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)

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