InP/InGaAs/InP双异质结双极晶体管的热载流子诱导退化

Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon
{"title":"InP/InGaAs/InP双异质结双极晶体管的热载流子诱导退化","authors":"Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon","doi":"10.1109/ICIPRM.1999.773729","DOIUrl":null,"url":null,"abstract":"In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.","PeriodicalId":213868,"journal":{"name":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Hot-carrier induced degradation in InP/InGaAs/InP double heterojunction bipolar transistors\",\"authors\":\"Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon\",\"doi\":\"10.1109/ICIPRM.1999.773729\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.\",\"PeriodicalId\":213868,\"journal\":{\"name\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1999.773729\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1999.773729","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

摘要

本文报道了InP/InGaAs/InP双异质结双极晶体管的偏置应力测试和热载流子诱导退化行为。我们发现,在反偏置B-C结应力期间,发射极-集电极反向电流(I/sub CEO/)出现了不可恢复的增加,这主要是由于B-C结泄漏电流的增加。此外,在B-C偏置应力过程中,热载流子引起的损伤不仅发生在B-C结区域,也发生在B-E结区域。这随后导致器件电流增益(/spl beta/)的退化。我们还展示了器件退化对不同应力偏置电压的依赖性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hot-carrier induced degradation in InP/InGaAs/InP double heterojunction bipolar transistors
In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信