Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon
{"title":"InP/InGaAs/InP双异质结双极晶体管的热载流子诱导退化","authors":"Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon","doi":"10.1109/ICIPRM.1999.773729","DOIUrl":null,"url":null,"abstract":"In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.","PeriodicalId":213868,"journal":{"name":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Hot-carrier induced degradation in InP/InGaAs/InP double heterojunction bipolar transistors\",\"authors\":\"Hong Wang, G. Ng, S. Mcalister, R. Driad, R. Mckinnon\",\"doi\":\"10.1109/ICIPRM.1999.773729\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.\",\"PeriodicalId\":213868,\"journal\":{\"name\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1999.773729\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1999.773729","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hot-carrier induced degradation in InP/InGaAs/InP double heterojunction bipolar transistors
In this paper, bias stress tests and hot carrier induced degradation behavior in InP/InGaAs/InP double heterojunction bipolar transistors are reported. We have found that an unrecoverable increase of emitter-collector reverse current (I/sub CEO/) occurs during reverse-bias B-C junction stress, which is mainly due to the increase of the B-C junction leakage current. Furthermore, the hot carrier induced damage during the B-C bias stress does not only occur at the B-C junction but also at the B-E junction region. This subsequently causes the degradation of the device current gain (/spl beta/). We also show the dependence of the device degradation on different stress bias voltages.