具有异质集成新型测量工具的高通量直接自适应成像系统

S. Majima, A. Hatano, S. Takada
{"title":"具有异质集成新型测量工具的高通量直接自适应成像系统","authors":"S. Majima, A. Hatano, S. Takada","doi":"10.1109/ISSM51728.2020.9377529","DOIUrl":null,"url":null,"abstract":"Demand of heterogeneous integration has increased for high-performance computing devices, utilizing panel level packaging and high-resolution lithography. We have developed a flexible direct imaging tool and a high-speed chip position measurement tool for Fan-Out Panel Level Packaging (FO-PLP). The imaging tool is capable of 2/2μm Line/Space resolution, chip displacement exposure compensation and includes an Auto-Wiring function which can expose patterns to connect individual chips independent of position displacement. With measurement tool throughput of 30 Panel Per Hour (PPH), the combination of these tools enables high-throughput adaptive patterning for cost effective heterogeneous integration.","PeriodicalId":270309,"journal":{"name":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High- Throughput Direct Adaptive Imaging System with Novel Measurement Tool for Heterogeneous Integration\",\"authors\":\"S. Majima, A. Hatano, S. Takada\",\"doi\":\"10.1109/ISSM51728.2020.9377529\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Demand of heterogeneous integration has increased for high-performance computing devices, utilizing panel level packaging and high-resolution lithography. We have developed a flexible direct imaging tool and a high-speed chip position measurement tool for Fan-Out Panel Level Packaging (FO-PLP). The imaging tool is capable of 2/2μm Line/Space resolution, chip displacement exposure compensation and includes an Auto-Wiring function which can expose patterns to connect individual chips independent of position displacement. With measurement tool throughput of 30 Panel Per Hour (PPH), the combination of these tools enables high-throughput adaptive patterning for cost effective heterogeneous integration.\",\"PeriodicalId\":270309,\"journal\":{\"name\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM51728.2020.9377529\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM51728.2020.9377529","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

利用面板级封装和高分辨率光刻技术的高性能计算设备对异构集成的需求有所增加。我们开发了一种灵活的直接成像工具和高速芯片位置测量工具,用于扇出面板级封装(FO-PLP)。该成像工具具有2/2μm的线/空间分辨率,芯片位移曝光补偿,并包括一个自动布线功能,可以暴露模式,以连接独立于位置位移的单个芯片。测量工具的吞吐量为每小时30个面板(PPH),这些工具的组合可以实现高通量自适应模式,从而实现具有成本效益的异构集成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High- Throughput Direct Adaptive Imaging System with Novel Measurement Tool for Heterogeneous Integration
Demand of heterogeneous integration has increased for high-performance computing devices, utilizing panel level packaging and high-resolution lithography. We have developed a flexible direct imaging tool and a high-speed chip position measurement tool for Fan-Out Panel Level Packaging (FO-PLP). The imaging tool is capable of 2/2μm Line/Space resolution, chip displacement exposure compensation and includes an Auto-Wiring function which can expose patterns to connect individual chips independent of position displacement. With measurement tool throughput of 30 Panel Per Hour (PPH), the combination of these tools enables high-throughput adaptive patterning for cost effective heterogeneous integration.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信