等离子体化学技术制备硅基光敏光纤的潜力

K. Golant, E. Dianov
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引用次数: 0

摘要

紫外辐射作用下硅基光纤的不可逆折射率变化(光折变效应)与芯玻璃(Si-ODC和Ge-ODC)中氧空位的存在有关。虽然光折变效应的微观机制尚未详细确定,但Ge-ODC由于其以242 nm为中心的强吸收带,确保了紫外光进入光纤芯。当然,提高硅基纤维光敏性的方法之一是优化预制体制造制度,以最大限度地提高Ge-ODC浓度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The potentialities of the plasmachemical technology for fabrication of silica-based photosensitive optical fibers
Irreversible refractive index changes in silica-based optical fibers under the action of UV radiation (photorefractive effect) are associated with the presence of oxygen vacancies in the core glass (Si-ODC & Ge-ODC). Although the microscopic mechanism of the photorefractive effect has not been established in detail, it is Ge-ODC that ensure UV light delivery into the fiber core owing to their strong absorption band centered at 242 nm. Naturally, one of the ways of increasing photosensitivity of silica-based fibers is optimization of the preform fabrication regimes with a view to maximize the Ge-ODC concentration.
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