BGA结构缺陷和焊点缺陷的三维x射线层析测定

T. Moore, D. Vanderstraeten, P. Forssell
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引用次数: 16

摘要

近年来,x射线层析成像的设备和软件发展迅速。最新的系统可以在IC封装中识别直径小至5 /spl μ m的特征,并在10 /spl μ m的三维空间内识别它们的位置。复杂的紧密间隔结构的细节可以很容易地提取与最近发展的显微层析成像。在这种分辨率下,这种方法被称为显微层析。本文介绍了用于IC封装失效分析的微层析系统的技术、方法和结果。在BGA衬底的建立层中的铜痕迹被单独提取和分析。通过破坏性物理分析(DPA)对许多BGA组件中焊阻平面上的焊线短路进行了定位和识别。在组装中创建和检查单个焊料球的3D重建并检查缺陷。这些分析不能通过普通的二维x射线完成;以前只有DPA可以提取这类信息。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of BGA structural defects and solder joint defects by 3D X-ray laminography
The equipment and software for X-ray laminography has advanced rapidly in recent years. The latest systems can distinguish features as small as 5 /spl mu/m in diameter and identify their locations to within 10 /spl mu/m in three dimensions within an IC package. Details of complex closely spaced structures can be extracted readily with recently developed microlaminographs. At this resolution, the method is termed microlaminography. In this paper, the technology, methodology and results from a microlaminography system developed for failure analysis in IC packaging are presented. The copper traces in the built up layers of a BGA substrate were extracted and analysed individually. Bond-wire shorts in the plane of the solder resist in a lot of BGA assemblies were located and identified with subsequent verification by destructive physical analysis (DPA). 3D reconstructions of individual solder balls within an assembly were created and examined for defects. These analyses could not have been done by normal 2D X-ray; formerly only DPA could extract such information.
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