D. Gaines, D. Sweeney, K. Delong, S. Vernon, S. Baker, D. Tichenor, R. Kestner
{"title":"EUV光刻光学元件的表面表征","authors":"D. Gaines, D. Sweeney, K. Delong, S. Vernon, S. Baker, D. Tichenor, R. Kestner","doi":"10.2172/378184","DOIUrl":null,"url":null,"abstract":"The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometery and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies extending from 2.0×10-8 nm-1 to 7.7×10-2 nm-1. Roughness values for frequencies greater than 1.0×10-6 nm-1 were 0.64 nm rms for a spherical optic and 0.95 nm rms for an aspheric optic. These values are significantly larger than 0.088 nm rms, which as obtained using a spherical optic representative of current limits in surface polishing technology.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"86 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Surface characterization of optics for EUV lithography\",\"authors\":\"D. Gaines, D. Sweeney, K. Delong, S. Vernon, S. Baker, D. Tichenor, R. Kestner\",\"doi\":\"10.2172/378184\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometery and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies extending from 2.0×10-8 nm-1 to 7.7×10-2 nm-1. Roughness values for frequencies greater than 1.0×10-6 nm-1 were 0.64 nm rms for a spherical optic and 0.95 nm rms for an aspheric optic. These values are significantly larger than 0.088 nm rms, which as obtained using a spherical optic representative of current limits in surface polishing technology.\",\"PeriodicalId\":201185,\"journal\":{\"name\":\"Extreme Ultraviolet Lithography (TOPS)\",\"volume\":\"86 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-05-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Extreme Ultraviolet Lithography (TOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2172/378184\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2172/378184","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Surface characterization of optics for EUV lithography
The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometery and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies extending from 2.0×10-8 nm-1 to 7.7×10-2 nm-1. Roughness values for frequencies greater than 1.0×10-6 nm-1 were 0.64 nm rms for a spherical optic and 0.95 nm rms for an aspheric optic. These values are significantly larger than 0.088 nm rms, which as obtained using a spherical optic representative of current limits in surface polishing technology.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
