光子定位技术(2022年更新)

C. Boit
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引用次数: 0

摘要

本报告概述了光子测量技术及其在集成电路故障隔离和缺陷定位中的应用。它涵盖了透射、反射和吸收方法,描述了关键的相互作用和重要的参数和方程。讨论的反射方法包括电光探测(EOP)、电光调频(EOFM)和激光电压成像(LVI)。所涵盖的吸收方法包括基于半导体光吸收的方法,如光束感应电流(OBIC)、光感应电压变化(LIVA)和激光辅助器件改变(LADA),以及基于金属吸收的方法,如热感应电压变化(TIVA)、光束感应电阻变化(OBIRCH)和热电电压产生或塞贝克效应成像(SEI)。报告还涵盖了热致发光(锁定热成像)和电致发光(光子发射)测量方法,并评估了当前和新兴光子定位技术带来的硬件安全风险。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photonic Localization Techniques (2022 Update)
This presentation provides an overview of photonic measurement techniques and their use in isolating faults and locating defects in ICs. It covers transmission, reflectance, and absorption methods, describing key interactions and important parameters and equations. Reflectance methods discussed include electro-optical probing (EOP), electro-optical frequency modulation (EOFM), and laser-voltage imaging (LVI). Absorption methods covered include those based on the absorption of light in semiconductors, as in optical beam induced current (OBIC), light-induced voltage alteration (LIVA), and laser-assisted device alteration (LADA), and those based on absorption in metals, as in thermally induced voltage alteration (TIVA), optical beam induced resistance change (OBIRCH), and thermoelectric voltage generation or Seebeck effect imaging (SEI). The presentation also covers thermoluminescence (lock-in thermography) and electroluminescence (photon emission) measurement methods and assesses hardware security risks posed by current and emerging photonic localization techniques.
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