半导体结构制造自动参数控制系统

Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303) Pub Date : 1999-07-26 DOI:10.1109/MMICA.1999.833598

O. Starostenko, J.G. Vazquez Luna, V. Khoma

{"title":"半导体结构制造自动参数控制系统","authors":"O. Starostenko, J.G. Vazquez Luna, V. Khoma","doi":"10.1109/MMICA.1999.833598","DOIUrl":null,"url":null,"abstract":"This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing.","PeriodicalId":221297,"journal":{"name":"Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Automatic parameter control system for semiconductor structures manufacturing\",\"authors\":\"O. Starostenko, J.G. Vazquez Luna, V. Khoma\",\"doi\":\"10.1109/MMICA.1999.833598\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing.\",\"PeriodicalId\":221297,\"journal\":{\"name\":\"Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-07-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MMICA.1999.833598\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MMICA.1999.833598","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文分析了半导体结构电气和非电气复杂参数的计算机测量设备的设计概念和研究进展。设计并应用于半导体生产的CV- gv特性自动参数控制，特别是用于电荷耦合CCD器件制造的工艺过程控制。分析了该测量系统对半导体特性采集和处理性能的影响。将这些信息作为反馈动作用于改进CCD结构制造的工艺流程。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Automatic parameter control system for semiconductor structures manufacturing

This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303)

自引率

0.00%

发文量