嵌入高k介电体中的低带隙纳米颗粒

T. Nestler, S. Haas, R. Otto, F. Schneider, S. Hickey, S. Gabriel, C. Himcinschi, V. Klemm, G. Schreiber, J. Heitmann
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引用次数: 0

摘要

本文综述了近年来在ZrO2中嵌入锗和PbS纳米颗粒的研究进展。通过对ZrGe2O2.9/ZrO2超晶格进行rf共溅射和退火,制备了锗纳米粒子。ZrO2和相分离的Ge在650℃下结晶成纳米晶层。这些层在2.5 eV时显示出发光信号,这是缺陷发光的原因。采用湿化学方法制备了PbS纳米颗粒,并采用溶胶-凝胶沉积法将其嵌入ZrO2基质中。在这种情况下,在100℃退火后,在1.3 μm处检测到发光信号。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-band gap nanoparticles embedded in high-K dielectrics
In this paper our recent research on Ge and PbS nanoparticles embedded in ZrO2 will be reviewed. Ge nanoparticles have been deposited by rf-cosputtering of ZrGe2O2.9/ZrO2 superlattices and subsequent annealing. ZrO2 and the phase separated Ge crystallizes at 650°C into nanocrystalline layers. These layers show a luminescence signal at 2.5 eV, which is contributed to defect luminescence. PbS nanoparticles have been fabricated using wet chemical methods and embedded in the ZrO2 matrix by sol-gel deposition. In this case a luminescence signal at 1.3 μm has been detected after annealing at 100°C.
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