GaAs双端亚微米器件的横向磁阻:近弹道状态下电子输运的表征

M. Hollis, N. Dandekar, L. Eastman, M. Shur, D. Woodard, R. Stall, C. Wood
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引用次数: 4

摘要

GaAs薄层中高速的弹道电子运动对高速、高频器件具有重要意义。这种电子传递模式的特点是平均自由程长度可达0.2微米,电子被加速到接近5 × 107厘米/秒的速度。我们报道了在MBE生长的亚微米GaAs层中[100]方向的弹道和近弹道电子输运的实验和理论研究结果。从I-V测量和磁电阻研究中得到的结果与理论模型的预测相结合,表明在短GaAs结构中达到了高漂移速度和大平均自由程长度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transverse magnetoresistance in GaAs two terminal submicron devices: A characterization of electron transport in the near ballistic regime
Ballistic electron motion at high velocity in thin layers of GaAs has important implications for high speed, high frequency devices. This mode of electron transport is characterized by mean free path lengths of up to 0.2 microns, over which the electrons are accelerated to velocities near 5 × 107cm/sec. We report the results of experimental and theoretical study of ballistic and near ballistic electron transport in the [100] direction in submicron GaAs layers grown by MBE. Results obtained from I-V measurements and magnetoresistance studies are interpreted in conjunction with the predictions of theoretical models to show that high values of drift velocity and large mean free path lengths are reached in short GaAs structures.
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