表面处理AlGaN/GaN hfet中的低频噪声

Ki-Sik Im, Jun-Hyeok Lee, Jung-Hee Lee, C. Theodorou, G. Ghibaudo, S. Cristoloveanu
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引用次数: 0

摘要

研究了具有不同栅极长度和栅极-漏极距离的表面处理AlGaN/GaN异质结场效应晶体管(hfet)的1/f噪声产生机制。从归一化漏极电流功率谱密度(PSD) SIdId2与Id的关系来看,栅极长度较短的AlGaN/GaN HFET在亚阈值区域表现出Hooge迁移率波动(HMF),在阈值栅极电压以上表现出载流子数波动(CNF)。另一方面,栅极长度为20 μm的HFET,与栅极偏压无关,其迁移率波动(CMF)都是相关的。栅极长度较短的栅极效应晶体管所提取的陷阱密度(Nt)明显小于栅极长度较长的栅极效应晶体管。输入栅极电压功率谱密度(PSD)证明栅极长度较短的fet具有较高的界面粗糙度散射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-frequency noise in surface-treated AlGaN/GaN HFETs
We investigated the 1/f noise generation mechanism in surface-treated AlGaN/GaN heterojunction field-effect transistors (HFETs) with different gate length and gate-to-drain distance (Lgd). From the normalized drain current power spectral density (PSD) SIdId2 versus Id, the AlGaN/GaN HFET with shorter gate length exhibited the Hooge mobility fluctuation (HMF) in subthreshold region and the carrier number fluctuation (CNF) above threshold gate voltage. On the other hand, the HFET with longer gate of 20 μm followed the correlated mobility fluctuation (CMF), irrespective of the gate bias. The extracted trap density (Nt) in the HFET with shorter gate length was noticeably less than that in the HFET with longer length. The input gate voltage power spectral density (PSD) proves that the HFET with shorter gate length suffers from higher interface roughness scattering.
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