{"title":"双端口SRAM读-扰-写机制及测试设计","authors":"R. Lo, S. Lu, Jordan Hsu, Quincy Li","doi":"10.23919/ISSM.2017.8089088","DOIUrl":null,"url":null,"abstract":"Dual Port (DP) needs asynchronous clock skew test to screen out read-disturb-write during simultaneous row access from both ports. We will explain read-disturb-write failure mechanism from simulation and Si. The BL clamped design and longer write word-line-pulse scheme can improve DP Vmin. 2D adaptive shmoo is also proposed to reduce test time.","PeriodicalId":280728,"journal":{"name":"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Dual port SRAM read-disturb-write mechanism and design for test\",\"authors\":\"R. Lo, S. Lu, Jordan Hsu, Quincy Li\",\"doi\":\"10.23919/ISSM.2017.8089088\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dual Port (DP) needs asynchronous clock skew test to screen out read-disturb-write during simultaneous row access from both ports. We will explain read-disturb-write failure mechanism from simulation and Si. The BL clamped design and longer write word-line-pulse scheme can improve DP Vmin. 2D adaptive shmoo is also proposed to reduce test time.\",\"PeriodicalId\":280728,\"journal\":{\"name\":\"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/ISSM.2017.8089088\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Joint International Symposium on e-Manufacturing and Design Collaboration (eMDC) & Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/ISSM.2017.8089088","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Dual port SRAM read-disturb-write mechanism and design for test
Dual Port (DP) needs asynchronous clock skew test to screen out read-disturb-write during simultaneous row access from both ports. We will explain read-disturb-write failure mechanism from simulation and Si. The BL clamped design and longer write word-line-pulse scheme can improve DP Vmin. 2D adaptive shmoo is also proposed to reduce test time.