摩尔定律——还有更多吗?

K. H. Brown
{"title":"摩尔定律——还有更多吗?","authors":"K. H. Brown","doi":"10.1109/IMNC.2000.872595","DOIUrl":null,"url":null,"abstract":"Lithography improvements and device scaling have been the major driver behind the industry productivity as predicted by Moore's law over the past three decades. In fact for the past five years, in an effort to remain the productivity curve when other improvements (e.g., tool reliability, process yield) have reached their practical limits, the industry has accelerated the introduction of smaller feature sizes. Between 1994 and 1999 the technology roadmap for feature size introduction has been pulled in three years. The current timeline has features below 0.13um introduced in product by 2001. The ability to continue on this path will be dominated by two key factors at dimensions below 0.13 /spl mu/m. The first factor is the approaching limits to the scaling laws and performance benefits at the chip level. The second is cost. The author briefly reviews possible future developments in this field.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Moore's law-is there more?\",\"authors\":\"K. H. Brown\",\"doi\":\"10.1109/IMNC.2000.872595\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lithography improvements and device scaling have been the major driver behind the industry productivity as predicted by Moore's law over the past three decades. In fact for the past five years, in an effort to remain the productivity curve when other improvements (e.g., tool reliability, process yield) have reached their practical limits, the industry has accelerated the introduction of smaller feature sizes. Between 1994 and 1999 the technology roadmap for feature size introduction has been pulled in three years. The current timeline has features below 0.13um introduced in product by 2001. The ability to continue on this path will be dominated by two key factors at dimensions below 0.13 /spl mu/m. The first factor is the approaching limits to the scaling laws and performance benefits at the chip level. The second is cost. The author briefly reviews possible future developments in this field.\",\"PeriodicalId\":270640,\"journal\":{\"name\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.2000.872595\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872595","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

正如摩尔定律所预测的那样,光刻技术的改进和设备的规模化是过去三十年来行业生产力背后的主要驱动力。事实上,在过去的五年中,当其他改进(例如,工具可靠性,过程产量)达到其实际极限时,为了保持生产率曲线,该行业加速了更小尺寸特征的引入。从1994年到1999年,特性尺寸引入的技术路线图在三年内被拉了出来。目前的时间表是2001年推出的0.13微米以下的产品。在低于0.13 /spl mu/m的维度上,继续沿着这条道路发展的能力将由两个关键因素决定。第一个因素是芯片级缩放定律和性能优势的接近极限。第二是成本。作者简要回顾了该领域未来可能的发展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Moore's law-is there more?
Lithography improvements and device scaling have been the major driver behind the industry productivity as predicted by Moore's law over the past three decades. In fact for the past five years, in an effort to remain the productivity curve when other improvements (e.g., tool reliability, process yield) have reached their practical limits, the industry has accelerated the introduction of smaller feature sizes. Between 1994 and 1999 the technology roadmap for feature size introduction has been pulled in three years. The current timeline has features below 0.13um introduced in product by 2001. The ability to continue on this path will be dominated by two key factors at dimensions below 0.13 /spl mu/m. The first factor is the approaching limits to the scaling laws and performance benefits at the chip level. The second is cost. The author briefly reviews possible future developments in this field.
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