B. Langdon, D. Patel, E. Krous, J. Rocca, C. Menoni, F. Tomasel, S. Kholi, P. Mccurdy, P. Langston, A. Ogloza
{"title":"工艺条件对高功率激光涂层HfO2/SiO2薄膜光学性能的影响","authors":"B. Langdon, D. Patel, E. Krous, J. Rocca, C. Menoni, F. Tomasel, S. Kholi, P. Mccurdy, P. Langston, A. Ogloza","doi":"10.1117/12.753027","DOIUrl":null,"url":null,"abstract":"We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm2 generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.","PeriodicalId":204978,"journal":{"name":"SPIE Laser Damage","volume":"6720 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":"{\"title\":\"Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings\",\"authors\":\"B. Langdon, D. Patel, E. Krous, J. Rocca, C. Menoni, F. Tomasel, S. Kholi, P. Mccurdy, P. Langston, A. Ogloza\",\"doi\":\"10.1117/12.753027\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm2 generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.\",\"PeriodicalId\":204978,\"journal\":{\"name\":\"SPIE Laser Damage\",\"volume\":\"6720 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-10-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"16\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SPIE Laser Damage\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.753027\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.753027","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings
We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm2 generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.