Akira Nakahira, Youske Inoue, Kazuyuki Fujii, K. Shirakawa, Hidehiko Kawaguchi
{"title":"先进电导率诊断技术的建立","authors":"Akira Nakahira, Youske Inoue, Kazuyuki Fujii, K. Shirakawa, Hidehiko Kawaguchi","doi":"10.1109/ISSM.2018.8651149","DOIUrl":null,"url":null,"abstract":"We have established an advanced diagnostic technology by using conductivity between parts of semiconductor equipment from RF perspective. In this paper, we explain an outline of our method and report the results which show its effectiveness.","PeriodicalId":262428,"journal":{"name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Establishment of An Advanced Diagnostic Technology by Conductivity\",\"authors\":\"Akira Nakahira, Youske Inoue, Kazuyuki Fujii, K. Shirakawa, Hidehiko Kawaguchi\",\"doi\":\"10.1109/ISSM.2018.8651149\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have established an advanced diagnostic technology by using conductivity between parts of semiconductor equipment from RF perspective. In this paper, we explain an outline of our method and report the results which show its effectiveness.\",\"PeriodicalId\":262428,\"journal\":{\"name\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2018.8651149\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2018.8651149","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Establishment of An Advanced Diagnostic Technology by Conductivity
We have established an advanced diagnostic technology by using conductivity between parts of semiconductor equipment from RF perspective. In this paper, we explain an outline of our method and report the results which show its effectiveness.