MOCVD生长GaN层的光学性质

R. Kudrawiec, L. Bryja, J. Misiewicz, R. Paszkiewicz, R. Korbutowicz, M. Panek, H. Paszkiewicz, M. Tlaczala
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引用次数: 0

摘要

利用光致发光(PL)和反射率测量研究了金属有机化学气相沉积(MOCVD)外延薄膜带间跃迁随温度(10 ~ 300k)的变化规律。在低温光致发光中观察到束缚激子和自由激子。在反射率测量中研究了自由激子能量的温度依赖性。在反射光谱中激子带间跃迁f9V。观察到4′7C(激子FX(A))、f7V(上波段)JT7C(激子FX(B))和F7′(下波段)I7C(激子FX(C))。从激子谱的温度依赖性出发,利用Varshni E(T)=E(O)-aT2/(T0+T)和Bosse-Einstein E(T)=E(O)-A/[exp(3/T)-1]表达式确定了能隙依赖性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical properties of GaN layers grown by MOCVD
The interband transitions in thin epitaxial films grown by metalorganic chemical vapour deposition (MOCVD) have been studied as a function of temperature (1 0-300K) by photoluminescence (PL) and reflectance measurements. In photoluminescence at low temperature bound and free excitons are observed. Temperature dependence of free exciton energies have been studied in reflectance measurement. In the reflectance spectra excitonic interband transitions f9V.4'7C (exciton FX(A)), f7V (upper band)JT7C (exciton FX(B)) and F7"(lower band)I7C (exciton FX(C)) were observed. From temperature dependence of the excitonic spectra the energy gap dependence is determined using both the Varshni E(T)=E(O)-aT2/(T0+T) and Bosse-Einstein E(T)=E(O)-A/[exp(3/T)-1] expressions.
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