高度可调谐硅量子点中单孔输运的观察

R. Li, F. Hudson, A. Dzurak, A. Hamilton
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引用次数: 0

摘要

我们报道了一种基于平面金属氧化物硅半导体(MOS)的单孔晶体管的低温电测量。多层栅电极结构允许独立控制引线和量子点的空穴密度。稳定的库仑封锁振荡在大范围内观察到最小的迟滞。隧穿势垒的可调性使点占据达到最后几个空穴,如源-漏偏置光谱所示。该结构具有高度的灵活性,可以通过适当的栅极偏置来定义双量子点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Observation of single hole transport in a highly tunable silicon quantum dot
We report the cryogenic-temperature electrical measurements of a planar silicon metal-oxide-semiconductor (MOS) based single hole transistor. A multi-layer gate electrode architecture allows independent control of hole densities in the leads and quantum dot. Stable Coulomb blockade oscillations are observed over a large range with minimal hysteresis. Separate tunability of the tunneling barrier enables the dot occupancy to reach the last few holes, as demonstrated by source-drain bias spectroscopy. The structure is highly flexible that a double quantum dot can be define by appropriate gate bias.
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