瞬态电容光谱法表征电活性缺陷

L. Vines
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引用次数: 0

摘要

在本章中,讨论了电活性缺陷的特征,并讨论了瞬态电容测量技术。本章首先介绍了描述缺陷电活动的主要特性,然后讨论了使用热发射和光发射测量这些特性的技术。综述了基于电容瞬态测量的关键技术,特别强调了DLTS,包括如何利用DLTS直接测量捕获截面和缺陷轮廓。本章的后一部分展示了使用的例子,其中硅的缺陷研究被选为一种很好的材料,其中大多数缺陷水平被确定,但仍然可以获得缺陷的基本知识。氧化锌(ZnO)中的缺陷也被讨论和选择作为研究较少的材料,其中直接识别缺陷水平的起源仍然是一个重要的挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterizing electrically active defects by transient capacitance spectroscopy
In this chapter, characterization of electrically active defects is discussed and transient capacitance measurement techniques are addressed. The chapter starts by introducing the main properties describing the electrical activity of a defect, before techniques to measure these properties using thermal and optical emission are discussed. Key techniques based on measuring capacitance transients are reviewed, with particular emphasis on DLTS, including how DLTS can be utilized for direct measurements of capture cross sections and defect profiles. The latter part of the chapter shows examples of use, where defect studies in silicon is chosen as a well established material where most of the defect levels are identified, but where fundamental knowledge of the defects can still be gained. Defects in zinc oxide (ZnO) is also discussed and chosen as a less studied material where direct identification of the origin of the defect levels remains an important challenge.
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