{"title":"半导体交叉晶圆厂计量工具对准控制规则","authors":"T. Wang, Ya-chuan Chan","doi":"10.1109/ISSM.2018.8651134","DOIUrl":null,"url":null,"abstract":"In response to the development in semiconductors, global semiconductor factories generally have cross-regional and cross-border Multi-Fab trends and needs; and with the needs of “new product types”, “next generation products” and “new customers”, consistent measurements must be developed. Cross-plant measurement machine consistency management mechanisms and methods should maintain cross-plant baseline to ensure product and production capacity’s flexibility and fast deployment, to achieve an open semiconductor foundry.","PeriodicalId":262428,"journal":{"name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Control rule of metrology tool alignment for semiconductor cross FABs\",\"authors\":\"T. Wang, Ya-chuan Chan\",\"doi\":\"10.1109/ISSM.2018.8651134\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In response to the development in semiconductors, global semiconductor factories generally have cross-regional and cross-border Multi-Fab trends and needs; and with the needs of “new product types”, “next generation products” and “new customers”, consistent measurements must be developed. Cross-plant measurement machine consistency management mechanisms and methods should maintain cross-plant baseline to ensure product and production capacity’s flexibility and fast deployment, to achieve an open semiconductor foundry.\",\"PeriodicalId\":262428,\"journal\":{\"name\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2018.8651134\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2018.8651134","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Control rule of metrology tool alignment for semiconductor cross FABs
In response to the development in semiconductors, global semiconductor factories generally have cross-regional and cross-border Multi-Fab trends and needs; and with the needs of “new product types”, “next generation products” and “new customers”, consistent measurements must be developed. Cross-plant measurement machine consistency management mechanisms and methods should maintain cross-plant baseline to ensure product and production capacity’s flexibility and fast deployment, to achieve an open semiconductor foundry.