{"title":"一种新的基于栅极长度的塑料封装CMOS器件阈值电压不稳定性","authors":"M. Noyori, Y. Nakata, S. Kuninobu","doi":"10.1109/IRPS.1983.361962","DOIUrl":null,"url":null,"abstract":"In order to evaluate the reliability of plastic encapsulated scaled CMOS devices, accelerated tests have been conducted. As a result, a new gate length dependent threshold voltage shift, which is approximately proportional to the reciprocal of the gate length, has been found. This paper describes the characteristics and mechanism of this phenomenon.","PeriodicalId":334813,"journal":{"name":"21st International Reliability Physics Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1983-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A New Gate Length Dependent Threshold Voltage Instability in Plastic Encapsulated Scaled CMOS Devices\",\"authors\":\"M. Noyori, Y. Nakata, S. Kuninobu\",\"doi\":\"10.1109/IRPS.1983.361962\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In order to evaluate the reliability of plastic encapsulated scaled CMOS devices, accelerated tests have been conducted. As a result, a new gate length dependent threshold voltage shift, which is approximately proportional to the reciprocal of the gate length, has been found. This paper describes the characteristics and mechanism of this phenomenon.\",\"PeriodicalId\":334813,\"journal\":{\"name\":\"21st International Reliability Physics Symposium\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1983-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"21st International Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.1983.361962\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1983.361962","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A New Gate Length Dependent Threshold Voltage Instability in Plastic Encapsulated Scaled CMOS Devices
In order to evaluate the reliability of plastic encapsulated scaled CMOS devices, accelerated tests have been conducted. As a result, a new gate length dependent threshold voltage shift, which is approximately proportional to the reciprocal of the gate length, has been found. This paper describes the characteristics and mechanism of this phenomenon.