高可靠性GaN-HEMT的退化模式分析

Y. Inoue, S. Masuda, M. Kanamura, T. Ohki, K. Makiyama, N. Okamoto, K. Imanishi, T. Kikkawa, N. Hara, H. Shigematsu, K. Joshin
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引用次数: 37

摘要

我们分析了GaN-HEMTs的降解模式。我们观察到突然退化对可靠性有严重的影响。本文提出了一种消除突然退化装置的新方法。通过在应力测试前测量栅极泄漏电流,可以预测突然退化。我们还讨论了栅极漏电流的影响因素,例如表面六角形凹坑。通过这种淘汰方法,我们可以选择在200℃高温下寿命超过1倍106小时的可靠器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation-Mode Analysis for Highly Reliable GaN-HEMT
We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 106 hours at high-temperature of 200degC.
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