具有动态单元偏置的低于600mv、耐波动的65nm CMOS SRAM阵列

Azeez Bhavnagarwala, Stephen V. Kosonocky, Y. Chan, Kevin Stawiasz, U. Srinivasan, Steve Kowalczyk, Matt Ziegler
{"title":"具有动态单元偏置的低于600mv、耐波动的65nm CMOS SRAM阵列","authors":"Azeez Bhavnagarwala, Stephen V. Kosonocky, Y. Chan, Kevin Stawiasz, U. Srinivasan, Steve Kowalczyk, Matt Ziegler","doi":"10.1109/VLSIC.2007.4342773","DOIUrl":null,"url":null,"abstract":"Combinations of circuit techniques enabling tolerance to Vtau fluctuations in SRAM cell transistors during read or write operations and significant reductions in minimum operating voltage are reported. Implemented in a 9 Kb times 74 b PDSOI CMOS SRAM array with a conventional 65 nm SRAM cell and an ABIST, these techniques, demonstrate VMIN of 0.58 V and 0.40 V/0.54 V for single and dual VDD implementations respectively. The techniques consume a 10-12% overhead in area, improve performance marginally and also enable over 50% reduction in cell leakage with minimal circuit overhead.","PeriodicalId":261092,"journal":{"name":"2007 IEEE Symposium on VLSI Circuits","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"39","resultStr":"{\"title\":\"A Sub-600mV, Fluctuation tolerant 65nm CMOS SRAM Array with Dynamic Cell Biasing\",\"authors\":\"Azeez Bhavnagarwala, Stephen V. Kosonocky, Y. Chan, Kevin Stawiasz, U. Srinivasan, Steve Kowalczyk, Matt Ziegler\",\"doi\":\"10.1109/VLSIC.2007.4342773\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Combinations of circuit techniques enabling tolerance to Vtau fluctuations in SRAM cell transistors during read or write operations and significant reductions in minimum operating voltage are reported. Implemented in a 9 Kb times 74 b PDSOI CMOS SRAM array with a conventional 65 nm SRAM cell and an ABIST, these techniques, demonstrate VMIN of 0.58 V and 0.40 V/0.54 V for single and dual VDD implementations respectively. The techniques consume a 10-12% overhead in area, improve performance marginally and also enable over 50% reduction in cell leakage with minimal circuit overhead.\",\"PeriodicalId\":261092,\"journal\":{\"name\":\"2007 IEEE Symposium on VLSI Circuits\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-06-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"39\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 IEEE Symposium on VLSI Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIC.2007.4342773\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE Symposium on VLSI Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIC.2007.4342773","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 39

摘要

电路技术的组合使得SRAM单元晶体管在读或写操作期间能够容忍Vtau波动,并显著降低最小工作电压。在9 Kb乘以74 b的PDSOI CMOS SRAM阵列中,采用传统的65 nm SRAM单元和ABIST,这些技术分别证明了单VDD和双VDD实现的VMIN分别为0.58 V和0.40 V/0.54 V。该技术消耗了10-12%的面积开销,略微提高了性能,并且以最小的电路开销减少了50%以上的电池泄漏。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Sub-600mV, Fluctuation tolerant 65nm CMOS SRAM Array with Dynamic Cell Biasing
Combinations of circuit techniques enabling tolerance to Vtau fluctuations in SRAM cell transistors during read or write operations and significant reductions in minimum operating voltage are reported. Implemented in a 9 Kb times 74 b PDSOI CMOS SRAM array with a conventional 65 nm SRAM cell and an ABIST, these techniques, demonstrate VMIN of 0.58 V and 0.40 V/0.54 V for single and dual VDD implementations respectively. The techniques consume a 10-12% overhead in area, improve performance marginally and also enable over 50% reduction in cell leakage with minimal circuit overhead.
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