多孔硅纳米结构在最佳光电氧化蚀刻时间下的电致发光和光致发光特性

M. A. Zubaidab, M. Rusop, S. Abdullah
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引用次数: 1

摘要

多孔硅纳米结构作为一种具有广阔应用前景的光电子材料受到了广泛的关注。在这个实验中,我们给出了光致发光和电致发光的测量方法。由于这种材料具有作为一种新型多孔硅基器件的潜力,因此对其电性能的研究。本实验的目的是测定pins的电致发光。以p型硅为衬底,采用光电阳极氧化法制备了PSiNs样品。在不同的蚀刻时间(10、20、30、40和50分钟)下,施加固定的电流密度(J=20 mA/cm2)形成PSiNs。在可见光范围内可以观察到光的发射。在~ 655nm处(样品时间为30min)观察到最大强度的有效EL光谱,与~ 675nm处的PL光谱相似。pins是一种非常有前途的发光二极管材料。多孔硅纳米结构发光二极管(PSiNs-LED)将是未来平面屏幕显示器件和高潜力需求器件之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electroluminescence and photoluminescence properties of porous silicon nanostructures with optimum etching time of photo-electrochemical anodization
Porous silicon nanostructures (PSiNs) has attracted attention as a promising material for optoelectronics applications. For this experiment, we present measurements of photoluminescence and electroluminescence of PSiNs. The study of the electrical properties of this material due to its potential as a novel porous silicon based devices. Objective of this experiment is to determine the electroluminescence of PSiNs. PSiNs samples were prepared by photo-electrochemical anodization using p-type silicon substrate. For the formation of PSiNs, a fixed current density (J=20 mA/cm2), was applied for the variety of etching time (10, 20, 30, 40 and 50 minutes). The light emission can be observed at visible range. Effective EL spectrum will be observed with its maximum intensity at ~655 nm (sample of 30 minutes), which is similar to its PL spectrum at ~675 nm. PSiNs is very promising material for light-emitting diode (LED) application. Porous silicon nanostructures light-emitting diode (PSiNs-LED) will be future flat screen display devices and one of the high potential demands of devices.
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