65 nm CMOS中总电离剂量(TID)实验的标度和温度效应研究

Loukas Chevas, Aristeidis Nikolaou, M. Bucher, N. Makris, A. Papadopoulou, A. Zografos, G. Borghello, H. D. Koch, F. Faccio
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引用次数: 10

摘要

欧洲核子研究中心(CERN)高亮度大型强子对撞机(HL-LHC)的升级预计将达到10倍的辐射水平。65nm的体硅CMOS在成本,性能和高总电离剂量(TID)的弹性方面具有明显的优势。本文研究了高TID辐照下MOS晶体管关键模拟设计参数的几何缩放问题。实验进行了100,200和高达500 Mrad(SiO2)的TID和−30°C, 0°C和25°C。我们发现参数在- 30°C时退化最小。然而,短通道nmost表现出明显的斜率因子退化,在0°C时比在25°C时更为严重。相比之下,短通道pmost的斜率因子对高TID的敏感性最低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of Scaling and Temperature Effects in Total Ionizing Dose (TID) Experiments in 65 nm CMOS
Ten-fold radiation levels are expected in the upgrade of the High-Luminosity Large Hadron Collider (HL-LHC) at CERN. Bulk silicon CMOS at 65 nm offers appreciable advantages among cost, performance, and resilience to high Total Ionizing Dose (TID). In the present paper, geometrical scaling of key analog design parameters of MOS transistors irradiated at high TID is investigated. Experiments are carried out for TID of 100, 200 and up to 500 Mrad(SiO2) and at −30°C, 0°C, and 25°C. We find that parameters are least degraded at −30°C. However, short-channel NMOSTs show a significant degradation of slope factor, which is more severe at 0°C than at 25°C. In contrast, the slope factor in short-channel PMOSTs shows lowest sensitivity to high TID.
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