微米和亚微米双极工艺的低功耗逻辑

P. Saul, R. J. Killips, D. G. Taylor
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引用次数: 0

摘要

在参考文献1中报告了对改进逻辑形式的第一次尝试。电路图如图1所示。该电路的主要特点是使用结场效应管代替“I2L”结构的PNP晶体管。这首先在一个3微米的快速数字工艺上进行了演示,该工艺不提供PNP,但需要具有高封装密度逻辑。由于该工艺的特点是“壁”发射极,因此通过将发射极植入物直接穿过p型电阻来提供场效应管是一项相对容易的任务。这就产生了一个器件,它同样可以被很好地描述为场效应管或“掐位”电阻。虽然在这个过程中不是特别快,但由于非常低的电流和NPN晶体管在“开”状态下的饱和,环路振荡器记录了非常好的功率延迟产物。这种类型的浇口将在下面的新工艺试验中提到。随着基于1微米的双极技术的出现,对节能逻辑的要求变得更加明显,因为该工艺每个芯片至少有20,000个门的能力。在大多数情况下,如果电路中没有这样做的要求,那么在功耗方面,以全速运行所有这些门是不切实际的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low Power Logic for Micron and sub-Micron Bipolar Processes
The first attempt at an improved logic form was reported in reference 1. The circuit diagram is shown in figure 1. The chief attribute of this circuit is the use of a junction FET in place of a PNP transistor in an "I2L" - like configuration. This was first demonstrated on a 3-micron fast digital process which did not offer a PNP, but where it was desirable to have high packing density logic. Since this process featured "walled" emitters, it was a relatively easy task to provide an FET by running the emitter implant straight across a p-type resistor. This generates a device which could equally well be described as an FET or as a "pinch" resistor. Although not particularly fast on this process, due to the very low current and the saturation of the NPN transistor in the "on" state, very good power-delay products were recorded for the ring oscillators. This style of gate will be mentioned below in the context of the new process trials. With the advent of a 1-micron based bipolar technology, the requirement for a power efficient logic became more obvious, since the process has a capability for at least 20,000 gates per chip. It would in most cases be impractical on power dissipation grounds to run all these gates at full speed if there was no requirement in the circuit to do so.
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