脉冲激光沉积(111)取向Si上Nd:YAG的x射线研究

International Conference on Solid State Crystals Pub Date : 2001-08-10 DOI:10.1117/12.435867

R. Rumianowski, R. Dygdala, F. Rozpłoch, A. Wojtowicz, M. Wisniewska, S. Kulesza

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引用次数: 2

摘要

采用脉冲激光沉积法在(111)取向Si衬底上制备了掺钕钇铝石榴石薄膜。将衬底加热到200 ~ 600℃的温度，然后用西门子D5000衍射仪和放射发光光谱对所得到的薄膜进行x射线衍射法的表征。

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X-ray study of Nd:YAG on (111)-oriented Si obtained by pulsed laser deposition

Yttrium aluminium garnet thin films doped with neodymium have been prepared by Pulsed Laser Deposition method on (111)-oriented Si substrates. The substrate was heated up to temperature in the range between 200 and 600 degrees C. Obtained films were then characterized both by x-ray diffraction method using Siemens D5000 diffracto-meter and radioluminescence spectroscopy.

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International Conference on Solid State Crystals

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